Electrostatic chuck with photo-patternable soft protrusion contact surface
In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface pl...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
14.10.2014
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Subjects | |
Online Access | Get full text |
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Summary: | In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer. |
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Bibliography: | Application Number: US201213667516 |