Lithographic apparatus and device manufacturing method

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling...

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Main Authors LIEBREGTS PAULUS MARTINUS MARIA, VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, BADAM VIJAY KUMAR, BRANDS GERT-JAN GERARDUS JOHANNES THOMAS, DE GROOT CASPER RODERIK, JACOBS JOHANNES HENRICUS WILHELMUS, VAN DER HOEVEN JAN CORNELIS, STAVENGA MARCO KOERT, KAMPHUIS MARTIJN HENDRIK, ANSTOTZ DAVID LUCIEN, KNAAPEN THIJS EGIDIUS JOHANNES, PELLENS RUDY JAN MARIA, BRULS RICHARD JOSEPH, VAN DER ZANDEN MARCUS JOHANNES, VERSPAGET COEN CORNELIS WILHELMUS, MAAS RUDOLF ADRIANUS JOANNES
Format Patent
LanguageEnglish
Published 15.07.2014
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
Bibliography:Application Number: US20090631113