Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample

An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high...

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Bibliographic Details
Main Authors ISHIGURO KOJI, SHICHI HIROYASU, TOMIMATSU SATOSHI, KANEOKA NORIYUKI, UMEMURA KAORU
Format Patent
LanguageEnglish
Published 15.07.2014
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Summary:An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.
Bibliography:Application Number: US201313926352