High selectivity, low damage electron-beam delineation etch

• Main Authors: CHANDLER CLIVE D, RANDOLPH STEVEN
• Format: Patent
• Language: English
• Published: 15.07.2014
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method and apparatus for selective etching a substrate using a focused beam. For example, multiple gases may be used that are involved in competing beam-induced and spontaneous reactions, with the result depending on the materials on the substrate. The gases may include, for example, an etchant ga...