Thermal inkjet print head with solvent resistance

A method of preparing an inkjet printing system with a print head in fluid communication with an ink reservoir and having a plurality of orifices and a corresponding plurality of associated ejection chambers includes providing a substrate and disposing a photoresist material on the substrate. A mask...

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Bibliographic Details
Main Authors LAMBRIGHT TERRY M, LEE FRANCIS CHEE-SHUEN, HALUZAK CHARLES C, TRUEBA KENNETH E, SELMECZY ANTHONY
Format Patent
LanguageEnglish
Published 27.05.2014
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Summary:A method of preparing an inkjet printing system with a print head in fluid communication with an ink reservoir and having a plurality of orifices and a corresponding plurality of associated ejection chambers includes providing a substrate and disposing a photoresist material on the substrate. A mask is provided between the UV light source and the photoresist material. The photoresist material is exposed to the UV light source to polymerize the photoresist material to form a barrier layer on the substrate. The barrier layer defines in part a plurality of fluid channels and the plurality of ejection chambers. An orifice plate is attached over the substrate. The orifice plate includes a plurality of orifices in fluid communication with the ejection chambers.
Bibliography:Application Number: US201313874067