Thermal inkjet print head with solvent resistance
A method of preparing an inkjet printing system with a print head in fluid communication with an ink reservoir and having a plurality of orifices and a corresponding plurality of associated ejection chambers includes providing a substrate and disposing a photoresist material on the substrate. A mask...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
27.05.2014
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Subjects | |
Online Access | Get full text |
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Summary: | A method of preparing an inkjet printing system with a print head in fluid communication with an ink reservoir and having a plurality of orifices and a corresponding plurality of associated ejection chambers includes providing a substrate and disposing a photoresist material on the substrate. A mask is provided between the UV light source and the photoresist material. The photoresist material is exposed to the UV light source to polymerize the photoresist material to form a barrier layer on the substrate. The barrier layer defines in part a plurality of fluid channels and the plurality of ejection chambers. An orifice plate is attached over the substrate. The orifice plate includes a plurality of orifices in fluid communication with the ejection chambers. |
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Bibliography: | Application Number: US201313874067 |