Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a hu...

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Main Authors MIRANDA MARCIO ALEXANDRE CANO, JANSEN HANS, BRUIJSTENS JEROEN PETER JOHANNES, JANSEN BAUKE, TANASA GHEORGHE, THOMAS IVO ADAM JOHANNES, BRULS RICHARD JOSEPH, MEESTER ARNOUT JOHANNES, LANDHEER SIEBE
Format Patent
LanguageEnglish
Published 20.05.2014
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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Summary:A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
Bibliography:Application Number: US20090559813