Compact metal connect and/or disconnect structures
Embodiments of present invention provide methods and apparatuses for connecting and/or disconnecting nodes in a semiconductor device. Embodiments of the apparatus may include a plurality of metal layers formed above a substrate and an interconnect structure formed between first and second nodes in t...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
25.03.2014
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Subjects | |
Online Access | Get full text |
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Summary: | Embodiments of present invention provide methods and apparatuses for connecting and/or disconnecting nodes in a semiconductor device. Embodiments of the apparatus may include a plurality of metal layers formed above a substrate and an interconnect structure formed between first and second nodes in the plurality of metal layers. The interconnect structure includes one or more metal lines formed in each of the metal layers. The metal lines are connected by a plurality of vias. Modifying one of the metal lines in any one of the metal layers changes an electrical connection between the first and second nodes. |
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Bibliography: | Application Number: US201113156399 |