Method for manufacturing crystal oscillator

The invention is directed to the provision of a method for manufacturing a crystal oscillator manufacturing method that can achieve a highly precise fine adjustment without applying unnecessary external force to a crystal oscillator, and that can adjust a plurality of crystal oscillators in a collec...

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Bibliographic Details
Main Authors YANAGISAWA TOHRU, KATOH AKIKO
Format Patent
LanguageEnglish
Published 04.03.2014
Subjects
BASIC ELECTRONIC CIRCUITRY
ELECTRICITY
GYROSCOPIC INSTRUMENTS
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
MEASURING
MEASURING DISTANCES, LEVELS OR BEARINGS
NAVIGATION
PHOTOGRAMMETRY OR VIDEOGRAMMETRY
PHYSICS
RESONATORS
SURVEYING
TESTING
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Summary:The invention is directed to the provision of a method for manufacturing a crystal oscillator manufacturing method that can achieve a highly precise fine adjustment without applying unnecessary external force to a crystal oscillator, and that can adjust a plurality of crystal oscillators in a collective manner. More specifically, the invention provides a method for manufacturing a crystal oscillator includes a first etching step for forming a prescribed external shape, an electrode forming step for forming an electrode at least in a portion of a surface of the external shape, a leakage amount measuring step for measuring leakage amount associated with leakage vibration of the external shape, and a second etching step for etching the external shape by an amount that is determined based on a measurement result of the leakage amount measuring step so as to adjust balance.
Bibliography:Application Number: US20090997927