Method and apparatus for forming film

• Main Authors: SATO KATSUMI, MIZUNO SEIJI, KIKUCHI TAKAYUKI, KONDO KYOUJI, NAKANISHI KAZUYUKI, ISEKI TAKASHI, FUNAKI YOSHIYUKI, OZAWA YASUHIRO, YAMADA YUKA, KOIZUMI MASAFUMI
• Format: Patent
• Language: English
• Published: 18.02.2014
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS

This invention adopts plasma-enhanced chemical vapor deposition using the apparatus including a chamber, a pair of rotary electrode reels including a feed-out reel and a take-up reel, a plasma source, a material gas supplier, and an exhaust unit, and includes applying a negative voltage applied to the rotary electrode reels from the plasma source while a conductive substrate is fed-out from the feed-out reel and is wound on the take-up reel so that the entire surface of the substrate portion between reels contacts the material gas, whereby plasma sheath is formed along the surface of the substrate portion between reels, and the material gas is activated in the plasma sheath and thus contacts the surface of the substrate, thus forming the film on the surface of the substrate.