Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation

An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a s...

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Main Authors PARKER N. WILLIAM, MCGINN JAMES B, KELLOGG SEAN, GRAUPERA ANTHONY, UTLAUT MARK W, WELLS ANDREW B
Format Patent
LanguageEnglish
Published 04.02.2014
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Summary:An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
Bibliography:Application Number: US201113165556