Inducement of strain in a semiconductor layer

Strain is induced in a semiconductor layer. Embodiments include inducing strain by, for example, creation of free surfaces.

Saved in:
Bibliographic Details
Main Authors CARROLL MARK, LOCHTEFELD ANTHONY J, FIORENZA JAMES
Format Patent
LanguageEnglish
Published 07.01.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Strain is induced in a semiconductor layer. Embodiments include inducing strain by, for example, creation of free surfaces.
Bibliography:Application Number: US201113013082