Analysis model generation system

• Main Authors: NISHIGAKI ICHIRO, HIRO YOSHIMITSU, KATAOKA ICHIRO
• Format: Patent
• Language: English
• Published: 17.12.2013
• Subjects: CALCULATING; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; PHYSICS

An analysis model generation system, for generating an analysis model of an analysis target, by correcting a distortion configuration owned by a configuration mesh data, which is generated by changing configuration of the analysis target, being made up with hexahedrons, into meshes, comprises a mesh data read-in portion 110 for reading the configuration mesh data therein, a mesh quality estimate portion 111 for estimating quality of a mesh of the configuration mesh data, a first database 101 for classifying distortion configuration of the mesh into a pattern, so as to register it therein as a distorted mesh pattern, in advance, a mesh pattern determination portion 112 for determining, on which one of the distorted mesh patterns a distortion corresponds, when the mesh has the distortion as a result of the quality estimation within the mesh quality estimation portion, a second database 115 for registering therein correction methods for correcting the distortion, corresponding to the distorted mesh pattern registered in the first database, a mesh correcting portion 113 for correcting the distortion of the mesh upon basis of the correction method, and a mesh data display portion 114 for displaying a result of conducting the correction.