Analysis model generation system

An analysis model generation system, for generating an analysis model of an analysis target, by correcting a distortion configuration owned by a configuration mesh data, which is generated by changing configuration of the analysis target, being made up with hexahedrons, into meshes, comprises a mesh...

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Bibliographic Details
Main Authors NISHIGAKI ICHIRO, HIRO YOSHIMITSU, KATAOKA ICHIRO
Format Patent
LanguageEnglish
Published 17.12.2013
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Summary:An analysis model generation system, for generating an analysis model of an analysis target, by correcting a distortion configuration owned by a configuration mesh data, which is generated by changing configuration of the analysis target, being made up with hexahedrons, into meshes, comprises a mesh data read-in portion 110 for reading the configuration mesh data therein, a mesh quality estimate portion 111 for estimating quality of a mesh of the configuration mesh data, a first database 101 for classifying distortion configuration of the mesh into a pattern, so as to register it therein as a distorted mesh pattern, in advance, a mesh pattern determination portion 112 for determining, on which one of the distorted mesh patterns a distortion corresponds, when the mesh has the distortion as a result of the quality estimation within the mesh quality estimation portion, a second database 115 for registering therein correction methods for correcting the distortion, corresponding to the distorted mesh pattern registered in the first database, a mesh correcting portion 113 for correcting the distortion of the mesh upon basis of the correction method, and a mesh data display portion 114 for displaying a result of conducting the correction.
Bibliography:Application Number: US20080260375