Lithographic apparatus and method

A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and seco...

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Main Authors HAGEMAN JOOST CYRILLUS LAMBERT, VAN BRUGGEN MATTHEUS JOHANNES, MULDER HEINE MELLE, PONGERS WILLEM RICHARD, BASELMANS JOHANNES JACOBUS MATHEUS, FAHRNI FRANCIS, ROOSEKRANS JOHANNES FRANCISCUS, THOMASSEN PATRICK MARCEL MARIA, BUTLER DAVID JAMES, KEIJSERS GERARDUS JOHANNES JOSEPH, PAEVA GABRIELA VESSELINOVA
Format Patent
LanguageEnglish
Published 17.12.2013
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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Summary:A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
Bibliography:Application Number: US20100966448