Optical element and method

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

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Bibliographic Details
Main Authors GRUNER TORALF, THIER MICHAEL, HAUF MARKUS, FOCHT GERHARD, TAYEBATI PAYAM, KAZI ARIF, EVA ERIC, SCHOENHOFF ULRICH, FLUEGGE OLE, SAUERHOEFER ALEXANDER, WEBER JOCHEN
Format Patent
LanguageEnglish
Published 13.08.2013
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
Bibliography:Application Number: US20100966552