Defect review system and method, and program

A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a functio...

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Bibliographic Details
Main Authors FUKUDA MUNEYUKI, OBARA KENJI, SHOJO TOMOYASU, SUZUKI NAOMASA, TAKAHASHI NORITSUGU
Format Patent
LanguageEnglish
Published 18.06.2013
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Summary:A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.
Bibliography:Application Number: US200913056353