Method and apparatus for sensing applied forces
An apparatus for sensing a force. The apparatus includes a nanostructure being suitable for emitting electrons and a collector. The collector is proximately positioned with respect to the nanostructure so as to receive the emitted electrons and define a gap therebetween. The gap is partially depende...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
02.04.2013
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Subjects | |
Online Access | Get full text |
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Summary: | An apparatus for sensing a force. The apparatus includes a nanostructure being suitable for emitting electrons and a collector. The collector is proximately positioned with respect to the nanostructure so as to receive the emitted electrons and define a gap therebetween. The gap is partially dependent upon the applied force and the emission and reception of the electrons are indicative of the applied force. |
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Bibliography: | Application Number: US20030553892 |