Method and apparatus for sensing applied forces

An apparatus for sensing a force. The apparatus includes a nanostructure being suitable for emitting electrons and a collector. The collector is proximately positioned with respect to the nanostructure so as to receive the emitted electrons and define a gap therebetween. The gap is partially depende...

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Bibliographic Details
Main Authors DARTY MARK ANTHONY, HABIB MOHAMADINEJAD
Format Patent
LanguageEnglish
Published 02.04.2013
Subjects
INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
MEASURING
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE
MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK
MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PHYSICS
TESTING
TRANSPORTING
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Summary:An apparatus for sensing a force. The apparatus includes a nanostructure being suitable for emitting electrons and a collector. The collector is proximately positioned with respect to the nanostructure so as to receive the emitted electrons and define a gap therebetween. The gap is partially dependent upon the applied force and the emission and reception of the electrons are indicative of the applied force.
Bibliography:Application Number: US20030553892