Resist composition, method of forming resist pattern, novel compound and acid generator

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound...

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Bibliographic Details
Main Authors HIDESAKA SHINICHI, UTSUMI YOSHIYUKI, MARUYAMA NATSUKO, KAWAUE AKIYA
Format Patent
LanguageEnglish
Published 05.02.2013
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q5 represents a single bond or a divalent linking group).
Bibliography:Application Number: US20090654066