Pushed-rule bit cells with new functionality
A memory bit cell suitable for use in semiconductor integrated circuits that utilizes pushed design rules and layout geometries optimized by a semiconductor foundry for standard memory bit cells and edge-cell structures that provides a different functionality from that provided by the foundry standa...
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Main Author | |
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Format | Patent |
Language | English |
Published |
15.01.2013
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Subjects | |
Online Access | Get full text |
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Summary: | A memory bit cell suitable for use in semiconductor integrated circuits that utilizes pushed design rules and layout geometries optimized by a semiconductor foundry for standard memory bit cells and edge-cell structures that provides a different functionality from that provided by the foundry standard bit cell. This different functionality is achieved by interconnecting the elements of one or a plurality of standard foundry bit cells and edge cells to implement a different circuit with different operation from the original bit cells and edge cells. The positioning and interconnection of the standard bit cells and edge cells are implemented in a manner so as to maintain the same periodic geometric proximity effects to the maximum degree possible. A preferred embodiment of this invention is to interconnect two standard foundry six-transistor SRAM bit cells and two edge cells to create a Ternary Content Addressable Memory bit cell with mask and compare functionality in addition to bit storage functionality. |
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Bibliography: | Application Number: US20090592472 |