Hybrid fin field-effect transistor structures and related methods
Semiconductor-on-insulator structures facilitate the fabrication of devices, including MOSFETs that are at least partially depleted during operation and FinFETs including bilayer fins and/or crystalline oxide.
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Main Author | |
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Format | Patent |
Language | English |
Published |
22.05.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Semiconductor-on-insulator structures facilitate the fabrication of devices, including MOSFETs that are at least partially depleted during operation and FinFETs including bilayer fins and/or crystalline oxide. |
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Bibliography: | Application Number: US20080125308 |