Method of producing substrate

The method of producing a substrate comprises the steps of: forming a through-hole in a base member; plating the base member so as to coat an inner face of the through-hole with a plated layer; applying photo resist on the base member; optically exposing and developing the photo resist so as to form...

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Main Authors IIDA KENJI, NAKAGAWA TAKASHI, MAEHARA YASUTOMO, HIRANO SHIN, YAMAWAKI SEIGO, OZAKI NORIKAZU, ABE TOMOYUKI, YOSHIMURA HIDEAKI
Format Patent
LanguageEnglish
Published 10.04.2012
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Summary:The method of producing a substrate comprises the steps of: forming a through-hole in a base member; plating the base member so as to coat an inner face of the through-hole with a plated layer; applying photo resist on the base member; optically exposing and developing the photo resist so as to form a resist pattern, which coats at least a planar area of the through-hole; and etching an electrically conductive layer formed on the surface of the base member. The resist pattern is formed so as to separate an area of exposing the conductive layer a prescribed distance away from an edge of the through-hole, and the prescribed length is longer than a distance of etching a side face of the conductive layer in the etching step.
Bibliography:Application Number: US20080175732