Apparatus and methods for determining overlay of structures having rotational or mirror symmetry
Disclosed are overlay targets having flexible symmetry characteristics and metrology techniques for measuring the overlay error between two or more successive layers of such targets. Techniques for imaging targets with flexible symmetry characteristics and analyzing the acquired images to determine...
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Main Author | |
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Format | Patent |
Language | English |
Published |
20.03.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed are overlay targets having flexible symmetry characteristics and metrology techniques for measuring the overlay error between two or more successive layers of such targets. Techniques for imaging targets with flexible symmetry characteristics and analyzing the acquired images to determine overlay or alignment error are disclosed. |
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Bibliography: | Application Number: US20090410317 |