Photomask manufacturing method, photomask manufacturing apparatus and photomask
A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performi...
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Main Author | |
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Format | Patent |
Language | English |
Published |
24.01.2012
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Subjects | |
Online Access | Get full text |
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Summary: | A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected. |
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Bibliography: | Application Number: US20080330734 |