Inspection apparatus for inspecting patterns of a substrate

A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an...

Full description

Saved in:
Bibliographic Details
Main Authors NOJIRI MASAAKI, HAYAKAWA KOICHI, NAKANO MICHIO, FUJII DAI, FUJISAWA TAKAKO, MIYAI HIROSHI
Format Patent
LanguageEnglish
Published 11.10.2011
Subjects
CALCULATING
COMPUTING
COUNTING
HANDLING RECORD CARRIERS
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
Online AccessGet full text

Cover

More Information
Summary:A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
Bibliography:Application Number: US20090564567