Calixarene blended molecular glass photoresists and processes of use
Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent,...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
09.08.2011
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Subjects | |
Online Access | Get full text |
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Summary: | Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a photoacid generator; and a solvent, and wherein the blend and the photoacid generator are soluble in the solvent. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition. |
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Bibliography: | Application Number: US20090507968 |