System and method for defect localization on electrical test structures
A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conduct...
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Format | Patent |
Language | English |
Published |
28.06.2011
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Online Access | Get full text |
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Abstract | A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect. |
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AbstractList | A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect. |
Author | LEVIN LIOR ALMOGY GILAD TALBOT CHRIS |
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Snippet | A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by... |
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Title | System and method for defect localization on electrical test structures |
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