System and method for defect localization on electrical test structures
A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conduct...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
28.06.2011
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Subjects | |
Online Access | Get full text |
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Summary: | A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect. |
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Bibliography: | Application Number: US20030530157 |