Method for manufacturing film or piezoelectric film

• Main Authors: YASUI MOTOHIRO, BABA SOU, AKEDO JUN
• Format: Patent
• Language: English
• Published: 07.06.2011
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

A simple method is provided for manufacturing a film such as a piezoelectric film wherein the adhesiveness of the film on a substrate can be improved. An aerosol containing particles is ejected onto a substrate so that the particles adhere thereto, wherein the ratio between the Vickers hardness Hv(b) of the adhesion surface to which the particles are attached in the substrate, and the Vickers hardness Hv(p) of the particles is within a range of 0.39 Hv(p)/Hv(b) 3.08. The adhesiveness between the particles and the substrate can thereby be improved to reliably form a film. The present invention can be satisfactorily applied to the formation of a piezoelectric film.