Extreme ultra violet light source apparatus

An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV lig...

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Bibliographic Details
Main Authors SUGANUMA TAKASHI, SOMEYA HIROSHI, WAKABAYASHI OSAMU, YABU TAKAYUKI, SUMITANI AKIRA, MORIYA MASATO, ABE TAMOTSU
Format Patent
LanguageEnglish
Published 12.04.2011
Subjects
CONVERSION OF CHEMICAL ELEMENTS
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
RADIOACTIVE SOURCES
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Summary:An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
Bibliography:Application Number: US20090385835