Developing method and method for fabricating semiconductor device using the developing method

• Main Authors: FUKUMOTO HIROFUMI, ASAHI KENICHI, KITAHARA HIDEKAZU, NODA KENJI, UJIMARU NAOHIKO
• Format: Patent
• Language: English
• Published: 08.02.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

In a developing method, a developer is supplied onto a resist film provided on a substrate, made of a resist and having an upper surface on which design patterns having different mask opening ratios are exposed and a development reaction is caused to proceed on the resist film with the supplied deve...