Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

• Main Authors: BAKKER LEVINUS PIETER, BANINE VADIM YEVGENYEVICH, WASSINK ARNOUD CORNELIS, SPEE CAROLUS IDA MARIA ANTONIUS, FRANKEN JOHANNES CHRISTIAAN LEONARDUS, MOORS JOHANNES HUBERTUS JOSEPHINA, BROM PAUL PETER ANNA ANTONIUS
• Format: Patent
• Language: English
• Published: 11.01.2011
• Subjects: ELECTROTHERAPY; HUMAN NECESSITIES; HYGIENE; MAGNETOTHERAPY; MEDICAL OR VETERINARY SCIENCE; RADIATION THERAPY; ULTRASOUND THERAPY

A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.