Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing g...

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Main Authors BAKKER LEVINUS PIETER, BANINE VADIM YEVGENYEVICH, WASSINK ARNOUD CORNELIS, SPEE CAROLUS IDA MARIA ANTONIUS, FRANKEN JOHANNES CHRISTIAAN LEONARDUS, MOORS JOHANNES HUBERTUS JOSEPHINA, BROM PAUL PETER ANNA ANTONIUS
Format Patent
LanguageEnglish
Published 11.01.2011
Subjects
ELECTROTHERAPY
HUMAN NECESSITIES
HYGIENE
MAGNETOTHERAPY
MEDICAL OR VETERINARY SCIENCE
RADIATION THERAPY
ULTRASOUND THERAPY
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Summary:A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.
Bibliography:Application Number: US20050051477