Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto
The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the sam...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
30.11.2010
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Subjects | |
Online Access | Get full text |
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Summary: | The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle. |
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Bibliography: | Application Number: US20050154951 |