Method of correcting a design pattern for an integrated circuit and an apparatus for performing the same

In an apparatus and method for automatically correcting a design pattern in view of different process defects, defect characteristic functions that indicate frequencies of each process defect independent from one another are generated, and a normalization factor that indicates relationships between...

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Bibliographic Details
Main Authors KIM JIN-HEE, JIN YOU-SEUNG, BAE CHOEL-HWYI, LEE DONG-HUN
Format Patent
LanguageEnglish
Published 23.11.2010
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:In an apparatus and method for automatically correcting a design pattern in view of different process defects, defect characteristic functions that indicate frequencies of each process defect independent from one another are generated, and a normalization factor that indicates relationships between the defect characteristic functions is determined. A general defect characteristic function indicating a frequency of general defects is generated using the defect characteristic functions and the normalization factor. The general defect causes the same process failure as caused by each of the process defects. The design pattern is modified using the general defect characteristic function in such a manner that the frequency of the general defects is minimized when at least one portion of the design pattern corresponding to the model pattern is transcribed on the substrate. Accordingly, the whole design pattern may be automatically corrected based on the general defect characteristic function.
Bibliography:Application Number: US20080080381