Auto focus system for reticle inspection

Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

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Bibliographic Details
Main Authors WRIGHT MICHAEL J, BELIN DANIEL L, WALSH ROBERT W, ALLES DAVID S
Format Patent
LanguageEnglish
Published 16.11.2010
Subjects
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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Summary:Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.
Bibliography:Application Number: US20080042326