Projection objective of a microlithographic projection exposure apparatus

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled wi...

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Bibliographic Details
Main Authors HAUF MARKUS, BLEIDISTEL SASCHA, KAZI ARIF, SCHWAER BAERBEL, TAYEBATI PAYAM, BITTNER BORIS, HUMMEL WOLFGANG, CONRADI OLAF, WEBER JOCHEN, HOLDERER HUBERT
Format Patent
LanguageEnglish
Published 09.11.2010
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
Bibliography:Application Number: US20080971328