Film pattern forming method, device, electro-optical apparatus, and electronic appliance

• Main Authors: HIRAI TOSHIMITSU, MORIYA KATSUYUKI
• Format: Patent
• Language: English
• Published: 28.09.2010
• Subjects: BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

A method for forming a film pattern by disposing a functional fluid on a substrate, includes: forming a partition wall that includes a first opening that corresponds to a first film pattern and a second opening that corresponds to a second film pattern; and disposing a droplet of the functional fluid into the first opening, so that the functional fluid is disposed into the second opening by a self-flow of the functional fluid; wherein: the first film pattern is linear; the second film pattern is narrower than the first film pattern, and is connected to the first film pattern at a rear edge thereof; and a front edge of the second film pattern has a missing part in which a corner of a rectangular contour is missing.