Method for generating a mask layout and constructing an integrated circuit

Methods are disclosed for the layout and manufacture of microelectronic circuits. The methods employ the monitoring of the placement of macros within circuit layouts for design rule compliance. Upon detection of noncompliance, the macros associated with noncompliance are adapted to bring the layout...

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Bibliographic Details
Main Author PITTS ROBERT L
Format Patent
LanguageEnglish
Published 24.08.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CALCULATING
CINEMATOGRAPHY
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Methods are disclosed for the layout and manufacture of microelectronic circuits. The methods employ the monitoring of the placement of macros within circuit layouts for design rule compliance. Upon detection of noncompliance, the macros associated with noncompliance are adapted to bring the layout within the design rules. In a preferred embodiment of the invention monitoring the relative positions of macros includes identifying instances of coinciding macro (x, y) coordinates. Adapting noncompliant macros further includes steps for maintaining minimum (x, y) distances between adjacent macro corners.
Bibliography:Application Number: US20050175775