Integrated circuit device and method of manufacture

A method of manufacturing a transistor is disclosed. The method includes forming a first and a second source/drain regions, a channel connecting the first and the second source/drain regions and a gate electrode for controlling the conductivity of the channel. The gate electrode is formed by definin...

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Bibliographic Details
Main Authors WANG PENG-FEI, STRASSER MARC, LUYKEN HANNES, NUETZEL JOACHIM, WEIS ROLF, SCHLOESSER TILL
Format Patent
LanguageEnglish
Published 27.07.2010
Subjects
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