Integrated circuit device and method of manufacture
A method of manufacturing a transistor is disclosed. The method includes forming a first and a second source/drain regions, a channel connecting the first and the second source/drain regions and a gate electrode for controlling the conductivity of the channel. The gate electrode is formed by definin...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
27.07.2010
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Subjects | |
Online Access | Get full text |
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