Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus

An optical system has fluoride compounds provided in an environment exposed by vacuum ultraviolet light or plasma light, which has higher photon energy than an absorption wavelength of a base stock of the optical system. 1-layer of a protective film of SiO2 or metal oxides having a film thickness of...

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Main Authors YAMAZAKI NORIKO, FUTAMI HIROSHI, KURIBAYASHI SHIZUMA, TSURUGA SHIGENORI, YAMAKOSHI HIDEO, SAKAI SATOSHI, DANNO MINORU
Format Patent
LanguageEnglish
Published 08.06.2010
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PERFORMING OPERATIONS
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:An optical system has fluoride compounds provided in an environment exposed by vacuum ultraviolet light or plasma light, which has higher photon energy than an absorption wavelength of a base stock of the optical system. 1-layer of a protective film of SiO2 or metal oxides having a film thickness of 2-20 nm is formed at least on the light irradiation side (inner side) of the optical system to prevent the stripping of the fluorine atoms from the surface of the optical system. In addition, the protective film is a 1-layer film selected from one of SiO2, MgO, TiO2, or ZrO2.
Bibliography:Application Number: US20070682794