Regional pattern density determination method and system

A method and system of determining a localized measure of regional pattern density in a fabrication process of a chip are disclosed. In one embodiment, the method includes determining pattern density values for each cell of a plurality of cells of interest; averaging the pattern density values for e...

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Bibliographic Details
Main Authors ABBOTT GEOFFREY K, PARKER DAVID P, LANDIS HOWARD S
Format Patent
LanguageEnglish
Published 20.04.2010
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:A method and system of determining a localized measure of regional pattern density in a fabrication process of a chip are disclosed. In one embodiment, the method includes determining pattern density values for each cell of a plurality of cells of interest; averaging the pattern density values for each cell within a first selected region about a target cell to determine the localized measure of regional pattern density for the target cell; storing the localized measure of regional pattern density for the target cell; and repeating the averaging and the storing for each of the plurality of cells. The simplification of data allows for a localized measure of regional pattern density determination in much less time than conventional techniques.
Bibliography:Application Number: US20060566884