Incorporating film optical property measurements into scatterometry metrology

A method includes collecting optical data from an unpatterned region including a first process layer. At least one optical parameter of the first process layer is determined based on the optical data associated with the unpatterned region. Optical data is collected from a patterned region including...

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Bibliographic Details
Main Authors HARTIG CARSTEN, CAIN JASON P
Format Patent
LanguageEnglish
Published 16.02.2010
Subjects
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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Summary:A method includes collecting optical data from an unpatterned region including a first process layer. At least one optical parameter of the first process layer is determined based on the optical data associated with the unpatterned region. Optical data is collected from a patterned region including a second process layer. At least one characteristic of the patterned region is determined based on the optical data associated with the patterned region and the at least one optical parameter.
Bibliography:Application Number: US20070850072