Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English |
Published |
29.12.2009
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source. |
---|---|
Bibliography: | Application Number: US20080073128 |