Lithographic apparatus
The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped b...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
29.12.2009
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels. |
---|---|
Bibliography: | Application Number: US20050252230 |