Optical limiter having trimetallic nitride endohedral metallofullerence films
An exemplary optical limiter device (100) has an optically transmissive substrate (102) and a layer (104) on a first surface (106) of the substrate, the layer having a trimetallic nitride endohedral metallofullerene. The layer can be a thin film of the trimetallic nitride endohedral metallofullerene...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
04.08.2009
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Subjects | |
Online Access | Get full text |
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Summary: | An exemplary optical limiter device (100) has an optically transmissive substrate (102) and a layer (104) on a first surface (106) of the substrate, the layer having a trimetallic nitride endohedral metallofullerene. The layer can be a thin film of the trimetallic nitride endohedral metallofullerene, a layer material with a cavity containing a solution with the trimetallic nitride endohedral metallofullerene, a sol-gel with a trimetallic nitride endohedral metallofullerene, and a self assembled monolayer with a trimetallic nitride endohedral metallofullerene. The layers of trimetallic nitride endohedral metallofullerenes can be vapor deposited, solution deposited and/or self assembled onto optical components. The third-order nonlinear properties of these films provide desired transmission characteristics. |
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Bibliography: | Application Number: US20050594029 |