Dental materials based on radically polymerizable macromers with antimicrobial effect
Dental material which contains at least one compound of the formula [PG]m-R1-Z-SP-Y-R2-[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR', COO and/or OCONH, a subst...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
30.06.2009
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Subjects | |
Online Access | Get full text |
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Summary: | Dental material which contains at least one compound of the formula [PG]m-R1-Z-SP-Y-R2-[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR', COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof R2=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR', CONH CONR', COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobially active group; Z=is absent, O, S, an ester, amide or urethane group; Y=is absent, O, S, an ester, amide or urethane group, and which has a molecular weight of at least 1,000. |
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Bibliography: | Application Number: US20060502420 |