Lithographic apparatus and method for manufacturing a device

• Main Authors: LEVASIER LEON MARTIN, LOOPSTRA ERIK ROELOF, SENGERS TIMOTHEUS FRANCISCUS, BECKERS MARCEL, VAN EMPEL TJARKO ADRIAAN RUDOLF, VAN DEN SCHOOR LEON JOSEPH MARIE, VAN ASTEN NICOLAAS ANTONIUS ALLEGONDUS JOHANNES, BOX WILHELMUS JOSEPHUS, VAN LOENHOUT ELKE, MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS, OUWEHAND LUBERTHUS, JANSEN ROB
• Format: Patent
• Language: English
• Published: 02.06.2009
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; PHOTOGRAPHY; PHYSICS

A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.