Semiconductor device, method for manufacturing a semiconductor device and mask for manufacturing a semiconductor device
A semiconductor device with a substrate includes a structure. The structure has a first part and a second part. At least one section of the edge of the first part of the structure is at an essential constant distance measured parallel to the substrate to a first section of an edge of a second struct...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
19.05.2009
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| Subjects | |
| Online Access | Get full text |
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| Summary: | A semiconductor device with a substrate includes a structure. The structure has a first part and a second part. At least one section of the edge of the first part of the structure is at an essential constant distance measured parallel to the substrate to a first section of an edge of a second structure. At least one section of the edge of the second part of the structure is lined with an edge of a second section of the same second section. The first section of the edge of the second structure and a second section of the edge of the second structure merge at least at one point, whereby the angle between the tangents of the edges of the first and second section of the second structure is less than 90°. The structure and the second structure are distanced by a spacer structure. |
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| Bibliography: | Application Number: US20070700547 |