High repetition rate laser produced plasma EUV light source

An EUV light source and method include a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of a target ignition site to confine the plasma to the vicinity of the target ignition site, which is controlled using outputs from a target tacking system.

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Bibliographic Details
Main Author BOWERING NORBERT
Format Patent
LanguageEnglish
Published 28.04.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
COLORIMETRY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RADIATION PYROMETRY
TESTING
X-RAY TECHNIQUE
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Summary:An EUV light source and method include a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of a target ignition site to confine the plasma to the vicinity of the target ignition site, which is controlled using outputs from a target tacking system.
Bibliography:Application Number: US20060471434