Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement
Methods and apparatus for detecting and/or deriving the absolute values of and/or the relative changes in parameters such as the plasma potential and the ion flux using a Planar Ion Flux (PIF) probing arrangement are disclosed. The detected and/or derived values are then employed to control plasma p...
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| Main Author | |
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| Format | Patent |
| Language | English |
| Published |
19.08.2008
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| Subjects | |
| Online Access | Get full text |
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| Abstract | Methods and apparatus for detecting and/or deriving the absolute values of and/or the relative changes in parameters such as the plasma potential and the ion flux using a Planar Ion Flux (PIF) probing arrangement are disclosed. The detected and/or derived values are then employed to control plasma processing processes. |
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| AbstractList | Methods and apparatus for detecting and/or deriving the absolute values of and/or the relative changes in parameters such as the plasma potential and the ion flux using a Planar Ion Flux (PIF) probing arrangement are disclosed. The detected and/or derived values are then employed to control plasma processing processes. |
| Author | KEIL DOUGLAS L |
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| RelatedCompanies | LAM RESEARCH CORPORATION |
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| SubjectTerms | MEASURING MEASURING ELECTRIC VARIABLES MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE MEASURING MAGNETIC VARIABLES PHYSICS TESTING |
| Title | Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement |
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